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The guidelines and problems for homework #5 in isat 436 - micro/nanofabrication and applications, focusing on photolithography. Students are required to solve problems related to mask design, feature size calculation, and comparison between direct step-on-wafer and contact printing. The document also includes references to jaeger's textbook.
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ISAT 436 – Micro/Nanofabrication and Applications Spring 2002 Homework #5: Photolithography Due: 27 March 2002 Guidelines: Clearly label each problem. Clearly label the answer to each problem. For example, put a box around the number and its units. Show all your work, even if it is only scratch work. Problems: