Assignment6 0305-221 Introduction to Micro/Nanolithography
Follow “Standard for Complete answer” for submitting all homework assignments.
1. A tungsten source is operated at a temperature of 2100 K.
a. What is the wavelength of maximum output for this source?
b. What is the total exitance (M) for this source?
c. What is the ratio of the spectral radiant exitance at 436 nm to the spectral
radiant exitance at the wavelength of maximum output
[M(436nm)/M( max)]?
d. How could you improve the UV output from this source?
2. Using the web site for the US patent and Trademark Office
(http://www.uspto.gov/patft/), locate patents for the following and briefly describe
each patent:
a. UV radiation for photoresist exposure
b. someone from RIT
3. Describe a talk you’ve attended at the 27th Microelectronic Engineering
Conference on May 12 or 13, 2008. (Note: no class meeting on Wednesday May
13, 2008.)
4. Find a technical article on a nanolithography method (double-patterning, electron
beam, maskless lithography, EUV, nano-imprinting, self-assembly, etc.) and write
a 1/2 page summary.
